. . . . . . . . . .    ANM 2010     3rd International Conference on Advanced Nano Materials     12-15 September 2010 - Agadir, Morocco Back    Abstract ANMM270 ORGANIC- INORGANIC HYBRID MATERIALS BY ATOMIC LAYER DEPOSITION Ola Nilsen, Karina B. Klepper, Heidi Ø. Nielsen, Helmer Fjellvåg University of Oslo, Department of Chemistry, Centre for Materials Science and Nanotechnology, P.O.Box 1033 Blindern, N-0315 Oslo, Norway . The atomic layer deposition (ALD) technique has proved to be very suitable for deposition of thin films of organic- inorganic hybrid type of materials. This class of materials combines the rigid structures and physical properties of inorganic materials with the flexibility and physicochemical properties of organic compounds. The ALD growth of these nanostructured hybrid films is enabled by the use of highly reactive inorganic precursors and particular organic building units that can bond to the inorganic component via functional groups such as alcohols, carboxylic acids, amines, etc. The ALD technique enables design of such materials, constructed from a variety of inorganic and organic building units, at a resolution of one monolayer. This represents a major step forward with respect to nanostructured hybrid materials. Compared to the growth rate of purely inorganic materials by ALD, the growth rates for hybrid materials are much larger, and deposition rates as high as 4.2 nm/cycle has been demonstrated, thus enabling rapid depositions. Dependent on the type of the organic functional groups, the films range from air stable to air sensitive. Traditionally the ALD technique has been used for deposition of materials with a three dimensional network structure. With the aid of organic- inorganic hybrid materials it has also been possible to demonstrate growth of thin films of molecular type materials such as Alq3, Znq3 and Tiq4 (q = 8-hydroxyquinoline). These are potential candidates as luminescent materials in electroluminescent structures such as OLEDs. The unparalleled flexibility in the choice of building units provides a huge range of possible applications for hybrid materials. . © nanoAC . . . . . . . . . .

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